PRODUCT CENTER
Based on high-purity synthetic quartz materials, the YSM series mask template has extremely high transmittance and low metal impurity content. It has excellent quartz substrate processing, cleaning, and detection capabilities, and can strictly control the surface defects and defects of the mask substrate to meet customer needs.
Mask template substrate
Extremely high UV transmittance, very low impurity content, no bubbles, high surface quality
optical performance
• ppb purity, hydroxyl content<250ppm, ensuring good optical transmittance
• ArF 193nm > 90.2%
•KrF 248nm > 92%
• I-line 365nm > 92.5%
•g-line 436nm > 92.7%
Internal transmittance ≥ 99.5%/cm @ 193nm
Ensure good stress control and optical uniformity through preparation and processing techniques
Optical Transmittance Performance
Processing indicators
Capable of processing and testing quartz substrates for semiconductor masks
Multi line cutting
Double sided grinding and polishing
Ultrasonic cleaning, deep cleaning
• Defect detection
• Uniformity
Typical test values (test method: atomic force microscope)
Surface roughness test (10)μm*10μm）
index | Typical values | Rough machining value |
Roughness Ra | ≤0.2nm | <0.5nm |
Surface PV | ≤ 2 (upper and lower surfaces) | |
TTV | ≤2μm | ≤5μm |
Copyright (C) 2024 QUARTECS Co., Ltd. All rights reserved ICP备案号：
